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FOR SALE Applied Materials CVD SYSTEM Originally configured for TiN but converted to TEOS. Lines and heaters were added for TDMAT process. CH B P5000 CVD Universal chamber number 4161B, serial number 35393 CH C P5000 CVD Universal chamber number 4161C, serial number 35593-18 MKS baratrons Model 127AA-001008 TDMAT Schumacher Asolute qty 2 UNIT UFC 1100 N2 300 sccm (NF3) Equipment Description: A CVD Applied Materials wafer equipment with two TiN previously configured chambers for 200mm wafer. History of the equipment:this tool underwent an upgrade process from TiN to TEOS with subsequent addition of the heated lines,TDMAT controllers and heaters. The equipment has two process chambers installed on it,chamber B and chamber C,although it has been configured for four process chambers. Decontamination Process consisted in:chamber cleaning,gas line pumpdown and conditioning,gas line pressurizing(N2) and sealing,pipeline flushing and sealing and vacuum of the process line and its sealing. Equipment general components and parts: •P5000 Mainframe with two process chambers. Robot Handler-Cassette Handler-Storage Elevator-Storage Elevator Wafer Orienter-Elevator Brakes-Load Lock Particle Reduction Kit-Load Lock Chamber Bolt Down Lids-Load Lock Lid Lift-Wafer Positioning Sensor-I/O Wafer Sensor. AMAT Ozonator-Ozone Monitor-Liquid Source Delivery Cabinet-Wafer Cooling System-Turbo Flow Meter for both chambers-Endpoint System. Minicontroller-Thermo Electric Drivers-Chamber Interconnect PCBs-ESC Controller Rack/Electronics-VME. **TM, Registered trade mark, Applied Materials For more information and pictures on this machine follow the link below. http://www.fabsurplus.com/equip_owned/3419.html |