Msp 2300 wafer particle generation & deposition system

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Subject: Msp 2300 wafer particle generation & deposition system
MSP Particle Generation and Deposition System Calibrate wafer scanners
Evaluate efficiency of wet cleaning stations Deposit PSL Spheres and Process Particles down to 0.04 ┬Ám (Si, SiO2, Si3N4, TiO2, W, etc.)
Challenge CMP & Copper processes
Multiple Spot Deposition Up to 300mm Diameter
This unit was removed from a working environment, we welcome viewing at our facility.
we would reccomend having this unit professionally crated for transportation, cost is $600.00