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MSP Particle Generation and Deposition System Calibrate wafer scanners Evaluate efficiency of wet cleaning stations Deposit PSL Spheres and Process Particles down to 0.04 µm (Si, SiO2, Si3N4, TiO2, W, etc.) Challenge CMP & Copper processes Multiple Spot Deposition Up to 300mm Diameter This unit was removed from a working environment, we welcome viewing at our facility. we would reccomend having this unit professionally crated for transportation, cost is $600.00 |
