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Leybold semi-automatic Z550 cathode sputtering system equipped with: * Three PK150 magnetron sputtering cathodes (diameter 150 mm) * Hüttinger 2,5 kW RF sputtering power supply, type IS 2,5/13560S, with integrated matching unit * substrate table with water cooling and with RF-bias/RF-etching. * special flange to increase the high of the vacuum chamber so sputtering of higher substrates is possible * Mechanical prevacuum pump with Leybold diffusion pump * operating voltage: 380/400 VAC, 50 Hz. |
