Electrotech rf vacuum sputtering machine

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Subject: Electrotech rf vacuum sputtering machine
Electrotech MS6210 Sputtering system
* Fully automatic, production type sputtering system.
* Three triangular magnetron sputtering cathodes
* substrate table with water cooling and with RF-bias/RF-etching.
* Loadlock chamber equiped with fully sample lading system
* Mechanical prevacuum pump and 2 CTI cryopump
* operating voltage: 208/220 VAC, 50/60 Hz.