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Applied Materials P5000 CVD SYSTEM, 2 CHAMBER TEOS Oxide CVD for Sale. Manufacturer: Applied Materials Type: CVD SYSTEM, 2 CHAMBER TEOS Oxide CVD * Originally configured for TiN but converted to TEOS. * Lines and heaters were added for TDMAT process. * RF Generators ENI OEM 12B CH B P5000 CVD * Universal chamber number 4161B, serial number 35393 CH C P5000 CVD * Universal chamber number 4161C, serial number 35593-18 * MKS baratrons Model 127AA-001008 * TDMAT Schumacher Asolute qty 2 * RF Match Phase IV Gas panel configuration: STEC 4400M He 500 sccm (He) UNIT UFC 1100A N2 2slm (Ar) UNIT UFC 1100 N2 300 sccm (NF3) UNIT UFC 1660 N2 500 sccm N2 * P5000 MEAN CONFIGURATION Equipment Description: A CVD Applied Materials wafer equipment with two TiN previously configured chambers for 200mm wafer. * History of the equipment:this tool underwent an upgrade process from TiN to TEOS with subsequent addition of the heated lines,TDMAT controllers and heaters. The equipment has two process chambers installed on it,chamber B and chamber C,although it has been configured for four process chambers. * Decontamination Process consisted in:chamber cleaning,gas line pumpdown and conditioning,gas line pressurizing(N2) and sealing,pipeline flushing and sealing and vacuum of the process line and its sealing. * Equipment general components and parts: * Edwards QDP 80/QMB 500 F, * Q-Controller, RF Generator(ENI OEM 12B), * P5000 Mainframe with two process chambers. * RF Cable Liquid Source Ozonizer Load Locks * Storage Elevator Wafer Orienter- * Load Lock Particle Reduction Kit- * Load Lock Chamber Bolt Down Lids- * Wafer Positioning Sensor- * Liquid Source Delivery Cabinet- * Turbo Flow Meter for both chambers- * Thermo Electric Drivers- * Chamber Interconnect PCBs-ESC Controller Rack/Electronics- * VME. High Purity Gas Panel. For more information and pictures on this machine follow the link below. http://www.fabsurplus.com/equip_owned/3419.html Check my "about me" page and check out our website |
